Integrated platforms and fabrication
Our chips are fabricated in our in-house cleanroom. We develop low-temperature, CMOS-compatible deposition of silicon nitride with very low propagation loss, aluminium nitride processing, and design methods for microresonators, including machine-learning prediction of dispersion and sidewall nanostructures.
Draft text, to be reviewed by the group.
Selected publications
- Simplified Aluminum Nitride Processing for Low-Loss Integrated Photonics and Nonlinear Opticsnpj Nanophoton. 3, 13 (Mar 2026)arXiv:2506.22595 (June 2025)
- Fourth-harmonic UV light generation in integrated silicon nitride microresonatorsarXiv:2603.03255 (Mar 2026)
- Visible octave frequency combs in silicon nitride nanophotonic waveguides driven by Ti: sapphire lasersarXiv:2601.04047 (Jan 2026)
- Inverse-Designed Silicon Nitride NanophotonicsarXiv:2505.13383(May 2025)
- On-chip microresonator dispersion engineering via segmented sidewall modulationPhoton. Res. 13, 367 (Jan 2025)
- Low-Temperature Sputtered Ultralow-Loss Silicon Nitride for Hybrid Photonic IntegrationLaser & Photonics Reviews, 2300642 (2023)arXiv:2301.10758
- Geometry optimization for dark soliton combs in thin multimode silicon nitride microresonatorsOpt. Express 31, 41420-41427 (2023)
- Machine learning assisted inverse design of microresonatorsOpt. Express 31, 8020-8028 (2023)arXiv:2212.03243
From the news
Postdoc positions available
Paper on silicon nitride fabrication is among the most viewed papers in LPR
Shuangyou Zhang is awarded a DFG grant
Segmented sidewall modulation for dispersion engineering
Linear and Nonlinear Coupling of Light in Twin-Rods
Low loss silicon nitride photonics using room-temperature sputtering